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6.1 family: the next generation of III-V semiconductors for advanced CMOS applications: epitaxial growth and passivation challenges

Date

2012
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dc.contributor.authorMerckling, Clement
dc.contributor.authorAlian, AliReza
dc.contributor.authorFirrincieli, Andrea
dc.contributor.authorJiang, Sijia
dc.contributor.authorCantoro, Mirco
dc.contributor.authorDekoster, Johan
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorFirrincieli, Andrea
dc.contributor.imecauthorDekoster, Johan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.date.accessioned2021-10-20T13:29:08Z
dc.date.available2021-10-20T13:29:08Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21140
dc.source.conferenceAVS 59th Annual International Symposium and Exhibition
dc.source.conferencedate28/10/2012
dc.source.conferencelocationTampa, FL USA
dc.title

6.1 family: the next generation of III-V semiconductors for advanced CMOS applications: epitaxial growth and passivation challenges

dc.typeMeeting abstract
dspace.entity.typePublication
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