Publication:
Band alignment between (100)Si and Hf-based complex metal oxides
Date
| dc.contributor.author | Afanasiev, Valeri | |
| dc.contributor.author | Stesmans, Andre | |
| dc.contributor.author | Zhao, Chao | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Rittersma, Z.M. | |
| dc.contributor.author | Maes, Jan | |
| dc.contributor.imecauthor | Afanasiev, Valeri | |
| dc.contributor.imecauthor | Stesmans, Andre | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.imecauthor | Maes, Jan | |
| dc.date.accessioned | 2021-10-16T00:42:30Z | |
| dc.date.available | 2021-10-16T00:42:30Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10005 | |
| dc.source.beginpage | 102 | |
| dc.source.endpage | 105 | |
| dc.source.issue | 80 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 80 | |
| dc.title | Band alignment between (100)Si and Hf-based complex metal oxides | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |