Publication:
Removal of plasma-modified low-k layer using dilute HF: influence of concentration
Date
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Kesters, Els | |
| dc.contributor.author | Azioune, Ammar | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Pireaux, Jean-Jacques | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | Kesters, Els | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-16T02:49:05Z | |
| dc.date.available | 2021-10-16T02:49:05Z | |
| dc.date.issued | 2005-07 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10758 | |
| dc.source.beginpage | F21 | |
| dc.source.endpage | F24 | |
| dc.source.issue | 7 | |
| dc.source.journal | Electrochemical and Solid-State Letters | |
| dc.source.volume | 8 | |
| dc.title | Removal of plasma-modified low-k layer using dilute HF: influence of concentration | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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