Publication:

Smoothening of 193 immersion resist by 172 nm VUV exposure

Date

2010

Meeting abstract

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Author(s)

;

Vaglio Pret, Alessandro

;

;

Azarnouche, Laurent

;

;

Foubert, Philippe

;

;

Shamiryan, Denis

;

Baklanov, Mikhaïl

;

Boullart, Werner

Statistics

1838 since deposited on 2021-10-18

Acq. date: 2026-02-26