Publication:

High performance Si/SiGE pMOSFETs fabricated in a standard CMOS process technology

Date

2003
Journal article
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dc.contributor.authorCollaert, Nadine
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-15T04:10:26Z
dc.date.available2021-10-15T04:10:26Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7333
dc.source.beginpage1173
dc.source.endpage1177
dc.source.issue7
dc.source.journalSolid-State Electronics
dc.source.volume47
dc.title

High performance Si/SiGE pMOSFETs fabricated in a standard CMOS process technology

dc.typeJournal article
dspace.entity.typePublication
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