The effect of elevated temperature on the reliability of very thin oxide films

dc.contributor.author	Kaczer, Ben
dc.contributor.author	Degraeve, Robin
dc.contributor.author	Pangon, Nadège
dc.contributor.author	Nigam, Tanya
dc.contributor.author	Groeseneken, Guido
dc.contributor.imecauthor	Kaczer, Ben
dc.contributor.imecauthor	Degraeve, Robin
dc.contributor.imecauthor	Groeseneken, Guido
dc.contributor.orcidimec	Kaczer, Ben::0000-0002-1484-4007
dc.date.accessioned	2021-10-06T11:28:15Z
dc.date.available	2021-10-06T11:28:15Z
dc.date.issued	1999
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/3546
dc.source.beginpage	356
dc.source.conference	ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium.
dc.source.endpage	359
dc.title	The effect of elevated temperature on the reliability of very thin oxide films
dc.type	Proceedings paper
dspace.entity.type	Publication
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