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Development of post InGaAs CMP cleaning process for sub 10nm device application
Publication:
Development of post InGaAs CMP cleaning process for sub 10nm device application
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Date
2017-10
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Purushothaman, Muthukrishnan
;
Choi, In-Chan
;
Kim, Hyun-Tae
;
Teugels, Lieve
;
Kim, Tae-Gon
;
Park, Jin-Goo
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1855
since deposited on 2021-10-24
Acq. date: 2025-12-15
Citations
Metrics
Views
1855
since deposited on 2021-10-24
Acq. date: 2025-12-15
Citations