Publication:
Process optimization enabled by novel quantitative pattern collapse metrology
Date
| dc.contributor.author | Winroth, Gustaf | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-19T21:50:36Z | |
| dc.date.available | 2021-10-19T21:50:36Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2011 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20152 | |
| dc.source.conference | International Symposium on Lithography Extensions | |
| dc.source.conferencedate | 20/10/2011 | |
| dc.source.conferencelocation | Miami, FL USA | |
| dc.title | Process optimization enabled by novel quantitative pattern collapse metrology | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |