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The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers
Publication:
The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers
Date
1997
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vanhaelemeersch, Serge
;
Van den hove, Luc
;
Lee, Hean-Cheal
Journal
Abstract
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1956
since deposited on 2021-09-30
443
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1956
since deposited on 2021-09-30
443
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations