Publication:

Selective etch of Si and SiGe for gate-all-around device architecture

Date

2015-10

Proceedings Paper

https://doi.org/10.1149/06908.0147ecst

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Author(s)

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Witters, Liesbeth

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Hikavyy, Andriy

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Milenin, Alexey

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Horiguchi, Naoto

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Collaert, Nadine

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De Gendt, Stefan

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Holsteyns, Frank

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1855 since deposited on 2021-10-23

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Acq. date: 2026-05-16