Publication:

Selective etch of Si and SiGe for gate-all-around device architecture

Date

2015-10
Proceedings Paper
https://doi.org/10.1149/06908.0147ecst
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Author(s)

Wostyn, Kurt  
;
Sebaai, Farid  
;
Rip, Jens  
;
Mertens, Hans  
;
Witters, Liesbeth  
;
Loo, Roger  
;
Hikavyy, Andriy  
;
Milenin, Alexey  
;
Horiguchi, Naoto  
;
Collaert, Nadine  
;
Thean, Aaron  
;
Mertens, Paul  
;
De Gendt, Stefan  
;
Holsteyns, Frank  

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1851 since deposited on 2021-10-23
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