Publication:

Metal film characterization with qualified spreading resistance

Date

2003
Proceedings Paper
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dc.contributor.authorClarysse, Trudo
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorZhang, Wenqi
dc.contributor.authorMaex, Karen
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:10:15Z
dc.date.available2021-10-15T04:10:15Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7331
dc.source.beginpage305
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
dc.source.endpage313
dc.title

Metal film characterization with qualified spreading resistance

dc.typeProceedings paper
dspace.entity.typePublication
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