Publication:

Exploring thermal ALE for spin-torque majority gate applications

Date

2021
Meeting abstract
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorPhong, Nguyen
dc.contributor.authorCouet, Sebastien
dc.contributor.authorSouriau, Laurent
dc.contributor.authorStafford, Nathan
dc.contributor.authorPallem, Venkateswara
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-31T08:22:15Z
dc.date.available2021-10-31T08:22:15Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36628
dc.identifier.urlhttps://www.avssymposium.org/ALD2021/Sessions/Schedule/70135
dc.source.beginpageLI-ALE_WeM3-#%
dc.source.conferenceAtomic Layer Etching Workshop 2021
dc.source.conferencedate27/06/2021
dc.source.conferencelocationTampa, FL USA
dc.title

Exploring thermal ALE for spin-torque majority gate applications

dc.typeMeeting abstract
dspace.entity.typePublication
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