Publication:

The mechanism of low-k SiOCH film modification by oxygen atoms

Date

2010
Journal article
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Author(s)

Braginsky, O.V.
;
Kovalev, A.S.
;
Lopaev, D.V.
;
Malykhin, E.M.
;
Mankelevich, Y.A.
;
Rakhimova, T.V.
;
Rakhimov, A.T.
;
Vasilieva, A.N.
;
Zyryanov, S.M.
;
Baklanov, Mikhaïl

Journal

Journal of Applied Physics

Abstract

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1909 since deposited on 2021-10-18
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1909 since deposited on 2021-10-18
Acq. date: 2026-07-17

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