Publication:

Technology and reliability aspects of ultra-thin silicon dioxide layers

Date

1999
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dc.contributor.authorHeyns, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorMertens, Paul
dc.contributor.authorSchaekers, Marc
dc.contributor.authorBearda, Twan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.contributor.authorClaes, Martine
dc.contributor.authorHoussa, Michel
dc.contributor.authorVandewalle, N.
dc.contributor.authorAusloos, M.
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorHoussa, Michel
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.date.accessioned2021-10-06T11:21:09Z
dc.date.available2021-10-06T11:21:09Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3511
dc.source.conferenceInternational Symposium on Surface Science for Micro- and Nano-Device Fabrication - ISSS-3
dc.source.conferencedate29/11/1999
dc.source.conferencelocationTokyo Japan
dc.title

Technology and reliability aspects of ultra-thin silicon dioxide layers

dc.typeOral presentation
dspace.entity.typePublication
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