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Assist features: placement, impact and relevance

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dc.contributor.authorMochi, Iacopo
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLyakhova, Kateryna
dc.contributor.authorWittebrood, Friso
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorFliervoet, Timon
dc.contributor.authorWang, Shibing
dc.contributor.authorHsu, Stephen
dc.contributor.authorPlachecki, Vince
dc.contributor.authorBaron, Stan
dc.contributor.authorLaenens, Bart
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLyakhova, Kateryna
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2021-10-23T12:54:49Z
dc.date.available2021-10-23T12:54:49Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27022
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505811&resultClick=1
dc.source.beginpage97761S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, California, USA
dc.title

Assist features: placement, impact and relevance

dc.typeProceedings paper
dspace.entity.typePublication
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