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HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
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HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Chao
;
Van Elshocht, Sven
;
Conard, Thierry
;
Xu, Zhen
;
Richard, Olivier
;
Caymax, Matty
;
De Gendt, Stefan
;
Heyns, Marc
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1913
since deposited on 2021-10-15
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Acq. date: 2026-01-09
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Metrics
Views
1913
since deposited on 2021-10-15
2
last month
1
last week
Acq. date: 2026-01-09
Citations