Publication:

Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process

Date

2011
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorIshimoto, Toru
dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-19T14:28:56Z
dc.date.available2021-10-19T14:28:56Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19109
dc.source.beginpage79712H
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
22436.pdf
Size:
2.43 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions