Degradation of 248nm deep UV photoresist by ion implantation

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Author(s)

Tsvetanova, Diana

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Parac-Vogt, Tatjana

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Clemente, Francesca

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Vanstreels, Kris

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Conard, Thierry

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Franquet, Alexis

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Nguyen, D. A. P.

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Stesmans, Andre

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Journal

Journal of the Electrochemical Society

Metrics

1905 since deposited on 2021-10-19

Acq. date: 2025-10-24