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A printability study for phase-shift masks at 193nm lithography
Publication:
A printability study for phase-shift masks at 193nm lithography
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Date
2003
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Jonckheere, Rik
Journal
GMM-Fachbericht
Abstract
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1927
since deposited on 2021-10-15
Acq. date: 2025-12-17
Citations
Metrics
Views
1927
since deposited on 2021-10-15
Acq. date: 2025-12-17
Citations