Publication:

Functional water solutions to enable wet cleaning process for leading edge semiconductor device manufacturing

Date

2019
Meeting abstract
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dc.contributor.authorKesters, Els
dc.contributor.authorHideaki, Iino
dc.contributor.authorYuichi, Ogawa
dc.contributor.authorOniki, Yusuke
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorHideaki, Iino
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.date.accessioned2021-10-27T11:16:03Z
dc.date.available2021-10-27T11:16:03Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33267
dc.source.conferenceThe Surface Preparation and Cleaning Conference (SPCC) 2019
dc.source.conferencedate1/04/2019
dc.source.conferencelocationPortland US
dc.title

Functional water solutions to enable wet cleaning process for leading edge semiconductor device manufacturing

dc.typeMeeting abstract
dspace.entity.typePublication
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