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In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processing

Date

1997
Proceedings Paper
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dc.contributor.authorKondoh, Eiichi
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-30T08:34:08Z
dc.date.available2021-09-30T08:34:08Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1971
dc.source.beginpage245
dc.source.conferenceRapid Thermal and Integrated Processing VI
dc.source.conferencedate1/04/1997
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage251
dc.title

In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processing

dc.typeProceedings paper
dspace.entity.typePublication
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