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Roughness characterization in the frequency domain and LWR mitigation with post-litho processes

Date

2010
Proceedings Paper
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dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorFoubert, Philippe
dc.date.accessioned2021-10-18T22:39:29Z
dc.date.available2021-10-18T22:39:29Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18127
dc.source.beginpage763930
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

Roughness characterization in the frequency domain and LWR mitigation with post-litho processes

dc.typeProceedings paper
dspace.entity.typePublication
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