Publication:
2002 update on the SEMI standards task force on photomask qualification terminology
Date
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-14T21:57:28Z | |
| dc.date.available | 2021-10-14T21:57:28Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6452 | |
| dc.source.beginpage | 336 | |
| dc.source.conference | 22nd Annual BACUS Symposium on Photomask Technology | |
| dc.source.conferencedate | 1/10/2002 | |
| dc.source.conferencelocation | Monterey, CA USA | |
| dc.source.endpage | 342 | |
| dc.title | 2002 update on the SEMI standards task force on photomask qualification terminology | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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