Publication:

Efficient cleaning of low-k materials using single-wafer cleaning solution: a compatibility study and electrical characterization

Date

2005
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorVanderheyden, Rudi
dc.contributor.authorKesters, Els
dc.contributor.authorKenis, Karine
dc.contributor.authorConard, Thierry
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-16T02:49:41Z
dc.date.available2021-10-16T02:49:41Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10760
dc.source.beginpage164
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing IX
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
dc.source.endpage171
dc.title

Efficient cleaning of low-k materials using single-wafer cleaning solution: a compatibility study and electrical characterization

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions