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Improving the copper electroplating process for 3D-stacked integrated circuits
Publication:
Improving the copper electroplating process for 3D-stacked integrated circuits
Date
2008
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Luhn, Ole
;
Radisic, Alex
;
Ruythooren, Wouter
;
Vereecken, Philippe
;
Celis, Jean-Pierre
;
Van Hoof, Chris
;
Swinnen, Bart
Journal
Semiconductor Manufacturing China
Abstract
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1928
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations
Metrics
Views
1928
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations