Publication:

Higk-k materials for tunnel barrier engineering in floating-gate flash memories

Date

2005
Meeting abstract
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dc.contributor.authorBlomme, Pieter
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorRosmeulen, Maarten
dc.contributor.authorAkheyar, Amal
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorLorenzini, Martino
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorRosmeulen, Maarten
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRosmeulen, Maarten::0000-0002-3663-7439
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2021-10-16T00:47:13Z
dc.date.available2021-10-16T00:47:13Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10113
dc.source.conferenceMeeting Abstracts 208th Electrochemical Society
dc.source.conferencedate1/10/2005
dc.source.conferencelocationLos Angeles, CA USA
dc.title

Higk-k materials for tunnel barrier engineering in floating-gate flash memories

dc.typeMeeting abstract
dspace.entity.typePublication
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