Publication:

Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

Date

2001
Presentation
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dc.contributor.authorTsai, Wilman
dc.contributor.authorNohira, Hiroshi
dc.contributor.authorCarter, Richard
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorPétry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorYoung, Edward
dc.contributor.authorZhao, Chao
dc.contributor.authorMaes, Jos
dc.contributor.authorTuominen, Marko
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-14T18:00:40Z
dc.date.available2021-10-14T18:00:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5715
dc.source.conferenceIUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on
dc.source.conferencelocation
dc.title

Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

dc.typeOral presentation
dspace.entity.typePublication
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