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Short- and damage-free process for patterning magnetic tunnel junctions for high-density application
Publication:
Short- and damage-free process for patterning magnetic tunnel junctions for high-density application
Date
2015
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Radisic, Dunja
;
Souriau, Laurent
;
Paraschiv, Vasile
;
Goossens, Danny
;
Yamashita, Fumiko
;
Koizumi, Nao
;
Tahara, Shigeru
;
Nishimura, Eichi
;
Kim, Woojin
;
Donadio, Gabriele Luca
;
Crotti, Davide
;
Swerts, Johan
;
Mertens, Sofie
;
Lin, Tsann
;
Couet, Sebastien
;
Piumi, Daniele
;
Kar, Gouri Sankar
;
Furnemont, Arnaud
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1896
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations
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Views
1896
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations