Publication:

Understanding workfunction tuning in HKMG by Lanthanum diffusion combining simulations and measurements

Date

 
dc.contributor.authorSpessot, Alessio
dc.contributor.authorCaillat, Christian
dc.contributor.authorFazan, Pierre
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorSchram, Tom
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorFazan, Pierre
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorSchram, Tom
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.date.accessioned2021-10-21T12:16:38Z
dc.date.available2021-10-21T12:16:38Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23110
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6650587&queryText%3DUnderstanding+Workfunction+Tuning+in+HKMG+by+
dc.source.beginpage113
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate3/09/2013
dc.source.conferencelocationGlasgow UK
dc.source.endpage116
dc.title

Understanding workfunction tuning in HKMG by Lanthanum diffusion combining simulations and measurements

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
26965.pdf
Size:
939.44 KB
Format:
Adobe Portable Document Format
Publication available in collections: