Publication:

Extraction of the silicon film thickness on fully depleted SOI nMOSFETs using the black gate influence

Date

2000
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorNicolett, A. S.
dc.contributor.authorMartino, Joao Antonio
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-14T13:28:01Z
dc.date.available2021-10-14T13:28:01Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4619
dc.source.beginpage103
dc.source.conferenceProceedings of the XV SBmicro International Conference on Microelectronics and Packaging
dc.source.conferencedate18/09/2000
dc.source.conferencelocationManaus Brazil
dc.source.endpage107
dc.title

Extraction of the silicon film thickness on fully depleted SOI nMOSFETs using the black gate influence

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
4616.pdf
Size:
413.89 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions