Publication:
Low-leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20nm technology node in dynamic random access memory
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1887 since deposited on 2021-10-22
Acq. date: 2026-01-07
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1887 since deposited on 2021-10-22
Acq. date: 2026-01-07
Citations