Publication:
Low-leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20nm technology node in dynamic random access memory
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1891 since deposited on 2021-10-22
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Acq. date: 2026-07-19
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1891 since deposited on 2021-10-22
2last month
1last week
Acq. date: 2026-07-19
Citations