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Method for in-situ etch uniformity monitoring using plasma emission interferometry
Publication:
Method for in-situ etch uniformity monitoring using plasma emission interferometry
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Samara, Vladimir
;
de Marneffe, Jean-Francois
;
El Otell, Ziad
;
Economou, Demetre
Journal
Journal of Vacuum Science and Technology B
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1895
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Acq. date: 2025-12-10
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Metrics
Views
1895
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-10
Citations