Publication:
Impact of precursor chemistry and process conditions on the scalability of ALD HfO2 gate dielectrics
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1869 since deposited on 2021-10-18
10last month
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Acq. date: 2026-08-09
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Statistics
Views
1869 since deposited on 2021-10-18
10last month
2last week
Acq. date: 2026-08-09
Citations