Publication:
Impact of precursor chemistry and process conditions on the scalability of ALD HfO2 gate dielectrics
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1859 since deposited on 2021-10-18
3last month
Acq. date: 2025-12-10
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Views
1859 since deposited on 2021-10-18
3last month
Acq. date: 2025-12-10
Citations