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Impact of precursor chemistry and process conditions on the scalability of ALD HfO2 gate dielectrics
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1855 since deposited on 2021-10-18
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Acq. date: 2025-10-24
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Views
1855 since deposited on 2021-10-18
409item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations