Publication:
Recent advancements in 157nm resist performance
Date
| dc.contributor.author | Turnquest, K. | |
| dc.contributor.author | Graffenberg, V. | |
| dc.contributor.author | Patel, S. | |
| dc.contributor.author | Miller, D. | |
| dc.contributor.author | Dean, K. | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Van Roey, F. | |
| dc.contributor.author | Hermans, J. | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Wong, P. | |
| dc.contributor.author | Hansen, S. | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T23:25:41Z | |
| dc.date.available | 2021-10-14T23:25:41Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6897 | |
| dc.source.conference | 3rd International Symposium on 157nm Lithography | |
| dc.source.conferencedate | 3/09/2002 | |
| dc.source.conferencelocation | Antwerpen Belgium | |
| dc.title | Recent advancements in 157nm resist performance | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |