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Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces

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dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorGronheid, Roel
dc.contributor.authorLin, Guanyang
dc.contributor.authorCao, Yi
dc.contributor.authorRomo, Ainhoa
dc.contributor.authorSomervell, Mark
dc.contributor.authorNafus, Kathleen
dc.contributor.authorNealey, Paul
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.date.accessioned2021-10-22T05:05:07Z
dc.date.available2021-10-22T05:05:07Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24431
dc.source.conferenceSPIE Advanced Lithography 2014
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces

dc.typeMeeting abstract
dspace.entity.typePublication
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