Publication:

Design correction in extreme ultrviolet lithography

Date

2010-10
Journal article
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dc.contributor.authorFenger, Germain
dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.contributor.authorNiroomand, Ardavan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.date.accessioned2021-10-18T16:21:12Z
dc.date.available2021-10-18T16:21:12Z
dc.date.embargo9999-12-31
dc.date.issued2010-10
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17102
dc.source.beginpage43001
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume9
dc.title

Design correction in extreme ultrviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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