Publication:

Vapor phase decomposition - droplet collection evalutation of a wafer surface preparation system

Date

2000
Proceedings Paper
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorWitters, Thomas
dc.contributor.authorBoehme, W.
dc.contributor.authorGonchond, J. P.
dc.contributor.authorHuber, A.
dc.contributor.authorLerche, J.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorRink, I.
dc.contributor.authorWortelboer, R.
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-14T12:48:00Z
dc.date.available2021-10-14T12:48:00Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4253
dc.source.beginpage593
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage600
dc.title

Vapor phase decomposition - droplet collection evalutation of a wafer surface preparation system

dc.typeProceedings paper
dspace.entity.typePublication
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