Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Variable threshold resist models for lithography simulation
Publication:
Variable threshold resist models for lithography simulation
Date
1999
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
3738.pdf
443.01 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Randall, John
;
Ronse, Kurt
;
Marschner, Thomas
;
Goethals, Mieke
;
Ercken, Monique
Journal
Abstract
Description
Metrics
Views
2010
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2010
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations