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Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Publication:
Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Date
2008
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lauwers, Anne
;
Veloso, Anabela
;
Chang, Shou-Zen
;
Yu, HongYu
;
Hoffmann, Thomas Y.
;
Kerner, Christoph
;
Demand, Marc
;
Rothschild, Aude
;
Niwa, Masaaki
;
Satoru, Ito
;
Mitshashi, Riichirou
;
Ameen, Mike
;
Whittemore, Graham
;
Pawlak, Malgorzata
;
Vrancken, Christa
;
Demeurisse, Caroline
;
Mertens, Sofie
;
Vandervorst, Wilfried
;
Absil, Philippe
;
Biesemans, Serge
;
Kittl, Jorge
Journal
IEEE Electron Device Letters
Abstract
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1995
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1995
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations