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Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)

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2005 since deposited on 2021-10-17
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Acq. date: 2026-05-20

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2005 since deposited on 2021-10-17
4last month
1last week
Acq. date: 2026-05-20

Citations