Publication:

Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)

Date

2008
Journal article
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Author(s)

Lauwers, Anne  
;
Veloso, Anabela  
;
Chang, Shou-Zen
;
Yu, HongYu
;
Hoffmann, Thomas Y.
;
Kerner, Christoph  
;
Demand, Marc  
;
Rothschild, Aude
;
Niwa, Masaaki
;
Satoru, Ito
;
Mitshashi, Riichirou
;
Ameen, Mike
;
Whittemore, Graham
;
Pawlak, Malgorzata
;
Vrancken, Christa  
;
Demeurisse, Caroline  
;
Mertens, Sofie  
;
Vandervorst, Wilfried  
;
Absil, Philippe  
;
Biesemans, Serge  
;
Kittl, Jorge

Journal

IEEE Electron Device Letters

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1998 since deposited on 2021-10-17
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