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Impact of temperature and position dependent residual stress in porous silicon on the final pore shape after high temperature annealing

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dc.contributor.authorGhannam, Moustafa
dc.contributor.authorHassan, Mostafa Medhat
dc.contributor.authorDepauw, Valerie
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorGhannam, Moustafa
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-16T16:14:54Z
dc.date.available2021-10-16T16:14:54Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12189
dc.source.beginpage2015
dc.source.conference22nd European Photovoltaic Solar Energy Conference and Exhibition
dc.source.conferencedate3/09/2007
dc.source.conferencelocationMilano Italy
dc.source.endpage2018
dc.title

Impact of temperature and position dependent residual stress in porous silicon on the final pore shape after high temperature annealing

dc.typeProceedings paper
dspace.entity.typePublication
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