Publication:

Moiré effect-based Overlay target design for OPO improvements

Date

 
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.contributor.authorHajaj, E.
dc.contributor.authorShaphirov, D.
dc.contributor.authorAshwal, E.
dc.contributor.authorDror, C.
dc.contributor.authorYohanan, R.
dc.contributor.authorGhinovker, M.
dc.contributor.authorGordon, K.
dc.contributor.authorLiu, Z.
dc.contributor.authorLiu, X.
dc.contributor.authorGronheid, Roel
dc.contributor.authorSpielberg, H.
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-31T11:57:26Z
dc.date.available2021-10-31T11:57:26Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37279
dc.source.beginpage1161125
dc.source.conferenceSPIE Advanced Lithography
dc.source.conferencedate22/02/2021
dc.source.conferencelocationonline online
dc.title

Moiré effect-based Overlay target design for OPO improvements

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: