Publication:
Electron channeling contrast imaging: potential for future metrology in semiconductor industry
Date
| dc.contributor.author | Vystavel, Tomas | |
| dc.contributor.author | Prokhodtseva, Anna | |
| dc.contributor.author | Schulze, Andreas | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.date.accessioned | 2021-10-23T16:57:19Z | |
| dc.date.available | 2021-10-23T16:57:19Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27561 | |
| dc.identifier.url | http://ma.ecsdl.org/content/MA2016-02/30/1951.abstract?sid=370f3d35-2849-459c-a6eb-20f526c6222b | |
| dc.source.beginpage | 1951 | |
| dc.source.conference | 230 ECS Meeting: Pacific Rim Meeting - PRiME | |
| dc.source.conferencedate | 2/10/2016 | |
| dc.source.conferencelocation | Honolulu, HI USA | |
| dc.title | Electron channeling contrast imaging: potential for future metrology in semiconductor industry | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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