Publication:
Extending optical lithography to 0.1 µm ?
Date
| dc.contributor.author | Wauters, Jan | |
| dc.date.accessioned | 2021-10-01T09:46:17Z | |
| dc.date.available | 2021-10-01T09:46:17Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3149 | |
| dc.source.beginpage | 175 | |
| dc.source.endpage | 180 | |
| dc.source.journal | Semiconductor Fabtech | |
| dc.source.volume | 8 | |
| dc.title | Extending optical lithography to 0.1 µm ? | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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