Publication:

Nucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench width

Date

2015
Journal article
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dc.contributor.authorJiang, Sijia
dc.contributor.authorMerckling, Clement
dc.contributor.authorMoussa, Alain
dc.contributor.authorWaldron, Niamh
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCollaert, Nadine
dc.contributor.authorBarla, Kathy
dc.contributor.authorLanger, Robert
dc.contributor.authorThean, Aaron
dc.contributor.authorSeefeldt, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.accessioned2021-10-22T19:56:28Z
dc.date.available2021-10-22T19:56:28Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25434
dc.identifier.urlhttp://jss.ecsdl.org/content/4/7/N83.abstract?etoc
dc.source.beginpageN83
dc.source.endpageN87
dc.source.issue7
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume4
dc.title

Nucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench width

dc.typeJournal article
dspace.entity.typePublication
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