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Potentialities and limitations of low-energy TOF-ERDA for high resolution and quantitative profiling of thin films

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dc.contributor.authorGiangrandi, Simone
dc.contributor.authorBrijs, Bert
dc.contributor.authorArstial, K.
dc.contributor.authorSajavaara, T.
dc.contributor.authorVantomme, Andre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-16T16:16:02Z
dc.date.available2021-10-16T16:16:02Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12194
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
dc.title

Potentialities and limitations of low-energy TOF-ERDA for high resolution and quantitative profiling of thin films

dc.typeOral presentation
dspace.entity.typePublication
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