Publication:

Transient enhanced diffusion of Boron in Si

Date

2002
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorJain, Suresh
dc.contributor.authorSchoenmaker, Wim
dc.contributor.authorLindsay, Richard
dc.contributor.authorStolk, Peter
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorWillander, M.
dc.contributor.authorMaes, Herman
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-14T21:53:45Z
dc.date.available2021-10-14T21:53:45Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6429
dc.source.beginpage8919
dc.source.endpage8941
dc.source.issue11
dc.source.journalJournal of Applied Physics
dc.source.volume91
dc.title

Transient enhanced diffusion of Boron in Si

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles