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Assessment of OPC effectiveness using two-dimensional metrics

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dc.contributor.authorWiaux, Vincent
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorRonse, Kurt
dc.contributor.authorHoward, William B.
dc.contributor.authorMaurer, Wilhelm
dc.contributor.authorPreil, Moshe E.
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-15T00:01:26Z
dc.date.available2021-10-15T00:01:26Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7053
dc.source.beginpage395
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage406
dc.title

Assessment of OPC effectiveness using two-dimensional metrics

dc.typeProceedings paper
dspace.entity.typePublication
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