Publication:
Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system
Date
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Truffert, Vincent | |
| dc.contributor.author | Vereecke, Bart | |
| dc.contributor.author | Demuynck, Steven | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Truffert, Vincent | |
| dc.contributor.imecauthor | Vereecke, Bart | |
| dc.contributor.imecauthor | Demuynck, Steven | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
| dc.date.accessioned | 2021-10-19T15:16:34Z | |
| dc.date.available | 2021-10-19T15:16:34Z | |
| dc.date.issued | 2011 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19255 | |
| dc.source.beginpage | PS-TuM1 | |
| dc.source.conference | AVS 58th Annual International Symposium and Exhibition | |
| dc.source.conferencedate | 30/10/2011 | |
| dc.source.conferencelocation | Nashville, TN US | |
| dc.title | Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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