Publication:
2D and 3D photoresist line roughness characterization
Date
| dc.contributor.author | Vaglio Pret, Alessandro | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Kunnen, Eddy | |
| dc.contributor.author | Pargon, Erwine | |
| dc.contributor.author | Luere, Olivier | |
| dc.contributor.author | Bianchi, Davide | |
| dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.date.accessioned | 2021-10-20T17:21:12Z | |
| dc.date.available | 2021-10-20T17:21:12Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21659 | |
| dc.source.conference | 38th International Micro & Nano Engineering Conference - MNE | |
| dc.source.conferencedate | 10/09/2012 | |
| dc.source.conferencelocation | Tolouse France | |
| dc.title | 2D and 3D photoresist line roughness characterization | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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