Publication:

Fluid-photoresist interactions and imaging in high-index immersion lithography

Date

2009
Journal article
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dc.contributor.authorTran, H.V.
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFrench, R.H.
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-18T03:43:04Z
dc.date.available2021-10-18T03:43:04Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16322
dc.source.beginpage33006
dc.source.issue3
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume8
dc.title

Fluid-photoresist interactions and imaging in high-index immersion lithography

dc.typeJournal article
dspace.entity.typePublication
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